As an efficient preparation method of tungsten disulfide (WS2), high pressure synthesis has attracted more and more attention. The preparation process is simple, low-cost and environmentally friendly. And the prepared tungsten disulfide usually has high density, crystallinity and good symmetry.

Radio frequency sputtering is a common and simple method for preparing tungsten disulfide film that has good compact and coating binding force. And in the preparation process, tungsten disulfide target is discharged continuously by radio frequency excitation in inert gas.

Tungsten disulfide is a new kind of photocatalyst that has high photocatalytic activity. Such a photocatalyst can be widely used in photocatalytic water-splitting for hydrogen production, because it can effectively improve the utilization of solar energy and hydrogen production rate under visible light.

Reactive magnetron sputtering is a common and easy method for preparing tungsten disulfide film with high melting point. The preparation process involves the reactive deposition of atoms sputtered from tungsten targets and sulfur ions that produced by hydrogen sulfide (H2S).