Heat Treatment Temperature Influence Tungsten Trioxide Films

Producing tungsten trioxide nano films by magnetron sputtering method which after process by two steps heat-treatment the tungsten trioxide (WO₃) nano films more stable. Therefore, the heat treatment temperature has a great impact on producing nanoWO₃ films.

The film sputtering on a substrate initially is amorphous structures and not sensitive to any gas, so the films need for heat-treating, after the heat treatment the film has a polycrystalline structure and stability is improved. After the studies found when the heat treatment temperature is higher than 300 ℃ will produce 20 ~ 70nm WO₃ nano crystalline film, and then after 600 ℃ heat treatment to get good performance nano films. When the heat treatment is higher than 300 ℃, the average particle size and crack size has increased, so sensitivity decreased. But processing by two-step heat treatment can avoid this phenomenon. It was found that second stage heat treatment which the temperature at 600 ℃ the films particle size not larger and without cracks appear. Thus process by two-step heat treatment method can to obtain better properties WO₃ nano film than producing by high temperature.

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