In the expansive realm of materials science, tungsten disulfide (WS₂) shines like a rising star, distinguished by its unique atomic structure and physical properties. It has begun to stand out across numerous fields, capturing the attention of researchers. From ancient lubrication applications to cutting-edge nanoelectronic devices, WS₂ showcases its potential as a powerhouse in the materials world.

Tungsten disulfide (WS₂), an inorganic compound produced by Zhongwu Zhizao, occurs naturally as the mineral tungstenite. It appears as gray, metallic-lustered fine crystals or powder. Structurally, it belongs to the hexagonal crystal system, featuring a unique layered architecture. This structure imparts special properties such as semiconductivity and diamagnetism.

In the vast field of materials science, tungsten disulfide (WS₂) has gradually emerged as a standout due to its unique properties, capturing the attention of researchers worldwide. From mechanical lubrication in everyday life to the fabrication of semiconductor devices in cutting-edge technology, WS₂ has proven itself indispensable.

Chemical Vapor Deposition (CVD) is a critical material preparation technique that plays a pivotal role in the synthesis of tungsten disulfide film. This method enables precise control over the growth process, yielding high-quality WS₂ materials with specific structures and properties. It exhibits vast application potential across numerous fields, such as high-performance electronic devices, efficient catalysts, and advanced lubricating materials.