Radio frequency sputtering is a common and simple method for preparing tungsten disulfide film that has good compact and coating binding force. And in the preparation process, tungsten disulfide target is discharged continuously by radio frequency excitation in inert gas.

Nano tungsten disulfide can be prepared under high temperature and self-pressurization. During the preparation process, WO3 sol, dispersant DMSO and sublimed sulfur are reacted at 900°C. And nano tungsten disulfide with different morphologies can be prepared by controlling the preparation temperature.

Reactive magnetron sputtering is a common and easy method for preparing tungsten disulfide film with high melting point. The preparation process involves the reactive deposition of atoms sputtered from tungsten targets and sulfur ions that produced by hydrogen sulfide (H2S).

Nano tungsten disulfide is usually used as lubricant additive to improve the lubricating performance of original lubricating oil. However, it is prone to agglomeration during the addition, which is closely connected with its small particle size and high surface energy.