Preparation of Coated Carbide CVD Coating Method

Chemical vapor deposition is first used in carbide blade coating method, is currently widely used in the production of coated cemented carbide of a method. Currently, carbide coating technology is developing rapidly, the development of medium-temperature chemical vapor deposition, plasma-enhanced chemical vapor deposition and chemical vapor deposition, ion sputtering method.

High-Temperature Chemical Vapor Deposition

Chemical vapor deposition basic principle is: the product to be coated carbide into high-temperature chemical vapor deposition furnace, into the compound through the reaction of steam and gases at temperatures above 1000 ℃ chemical reaction and deposited on the surface of the product.

In the high-temperature coating furnace at 1 atm for coating. The area of ​​the coating or with a heater furnace, the reaction chamber, supply, exhaust systems, gas purification system, the gas flow control system components.

In recent years, has developed a multi-layer coating structure different functions of carbide cutting tools, such as TiC-TiCN-TiN, TiC-Al2O3-TiC composite coating layer such as WC-based cemented carbide inserts. Thermal expansion coefficient of TiC carbide substrate similar to the substrate with the coating and thus high strength; outermost months crater wear resistance of TiC coating performance; intermediate layer in between the properties of TiCN coating. Therefore, to ensure the coating) 9 has excellent performance and long life. U.S. Kennametal manufacturing multilayer (8-10 layers) coated carbide by the outer, middle active layer and the underlying components. Outer TiC coating reduces the generation of tumor knife; alternating combination of 0.5-0.7μm Al2O3 (3-4 layers) / 0.2-0. 5μm of: TiN (2-3 layers) intermediate active layer, the main function can ditch Crater wear is the anti-month, reducing chipping and to increase the bond strength between layers; underlying TiN and compared with TiCN (or TiC) layer, and thus ensure that the entire coating and substrate and the active layer an intermediate bonding smoothly.

Medium temperature chemical vapor deposition: the use of organic nitriles (CH3CN) class compounds substituted methane and nitrogen coatings can reduce the temperature to 700-900C.

Plasma-enhanced chemical vapor deposition: What is the use of electrical or electromagnetic excitation of gas discharge plasma for chemical vapor product of Ya Tuo method of coating.

coated carbide


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Preparation of Coated Carbide Physical Vapor Deposition Coating Method

By vacuum evaporation, sputtering, physical methods such as plasma ionization of the metal (Ti, Zr) from the melt (by evaporation) or solid (by spraying) with the gaseous phase transfer Popularity metallic component chemical reaction, the resulting compound is deposited is heated to about 500 ℃ on a cemented carbide substrate by physical vapor deposition process called coating. Physical vapor deposition coating method can trifoliate divided into three categories: deposition, sputtering and ion plating method. Date the most widely used is the pan vacuum arc evaporation, electron beam evaporation and magnetron sputtering speed. Physical vapor deposition and chemical vapor deposition has the following advantages compared.

(1) Due to the physical vapor deposition temperature is generally about 500 ℃, at this temperature, the coating and the substrate does not produce the diffusion layer, and thus the same intensity of the matrix;
(2) Coating has a fine structure, compressive stress in the coating, the coating toughness, high resistance to crack propagation capability;
(3) Coating the surface smooth, can effectively prevent the transverse crack.

Therefore, physical vapor deposition coating particularly suitable for coating the cutting insert. In order to ensure firm adhesion between coating and substrate, the substrate surface finish is very important, if the substrate surface defects, will result in the coating. Therefore, before the base coat and subject to erosion Kerry ultrasonic methods such as ion erosion processes.

Ion Plating Method

Ion plating (IP) method is a physical vapor deposition method, plasma excitation, and that the ion bombardment having an energy of the neutral atoms sputtered substrate after purification (before deposition) and the coating during the deposition process to control the nucleation and growth of process.

Vacuum Arc vapor Deposition Method

Vacuum arc vapor deposition method is a metal, an alloy or a compound arc evaporation in vacuo, ionization sputtered and deposited on the substrate a coating method.

coated carbide



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Cold Isostatic Molding

Compacts small size , shape and relatively simple tungsten alloy powder metallurgy products, can suppress the production of steel , but the large size, complex shape compacts ordinary steel can not be formed , should be used isostatic molding and other methods . Including isostatic cold isostatic pressing and hot isostatic pressing , cold isostatic pressing in which industrial production has been widely applied .

Isostatic high-pressure pump by means of action of the fluid medium ( gas or liquid ) into the pressure -resistant sealed container steel body , the static pressure of the fluid pressure acting directly on the elastic modulus comprising a powder , the powder is at the same time balanced in all directions on the pressure and density distribution and intensity to obtain high green compacts .
Cold isostatic fluid medium used is usually water or oil , soft mode with high-quality rubber or plastic.

Isostatic molding die press forming compared with the general , its advantages are: isostatic pressing , through the colloid applied to the soft mode is pressed over the entire outer surface of the body , can be made of complex shape , density , height and diameter ratio can be arbitrarily selected compacts , pressed , the powder with a small elastic relative movement of the mold , so the friction loss is small, the desired unit low pressure, density, green density and intensity are high, easy to transport and mechanical processing, and soft mold manufacturing cost is also low.

Isostatic pressing equipment : isostatic pressing Major equipment for isostatic press , the combination of mold and automatic loading machinery. In this case, only introduce cold isostatic pressing machine and soft mold production.

Cold isostatic pressing machine: cold isostatic pressing machine mainly by the high pressure vessel and fluid pressure pump components with fluid storage tank , pressure gauge , high pressure fluid transport pipes, high-pressure valves.

Industrial application of cold isostatic presses are mainly three types : rod isostatic press , screw-type isostatic presses , isostatic presses rack cabinet .

Soft mold making and technical requirements

Mold material selection and mold making : The different powder materials in the isostatic molding require different pressures , the static pressure of the metal powder 43-219MPa, carbide ceramics 70. 4-219MPa. Accordingly , the tungsten powder, isostatic pressing mold material need to be a certain degree of strength and flexibility should , loaded powder can keep the original geometry ; has a high anti-wear properties; ease of processing ; no pressure medium from physical and chemical effects ; material is not easy on the adhesion of the compacts , long life and low price .


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Tungsten and Tungsten Alloys Sintered Billet Direct Sintering Industrial Examples

The sintered tungsten, and alloys commonly used direct sintering, sintering indirect. Direct sintering method used for smaller size for bars, rods, wire and other tungsten alloy powder metallurgy and production of billets. Indirect sintering method used for large slab. Partial liquid phase sintering method for the preparation of tungsten and its alloy powder metallurgy products, such as tungsten slab, high density tungsten alloy, tungsten - copper alloy.

Tungsten furnace burn down preform is placed between two electrode holder, burn preform in a protective atmosphere of hydrogen (and other protective atmosphere or vacuum) in low voltage, high current, resistance heating sintering method called direct sintering method.

Direct sintering equipment: direct sintering of major equipment for the pre-burning furnace and vertical furnace, furnace structure common is hanging bell-type water-cooled, single and multi-hood-type hood.

Direct Sintering Process

Pre-Sintering

The purpose of pre-sintered compacts to exclude the fusible and volatile substances, improving spoon compacts conductivity and strength. Pre-sintering system based on blank grades and specifications determined.

Vertical Melt Sintering

Melting down the sintering process is mainly for controlling the current value system, the heating time and holding time, the cooling water temperature and flow. Generally vertical melt production, each batch of tungsten blanks in determining the technological system before, do first fuse test to determine the fusing current. Production of the highest vertical melt fusing current operating current of approximately 88% -93%.


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Tungsten and Tungsten Alloys Sintered Billet Indirect Sintering Industrial Examples

Tungsten and tungsten alloy compacts and pre-sintered preform is placed resistance furnace, induction furnace and other forms of legislation in the sintering furnace sintering method called indirect.

Indirect Sintering Equipment

Horizontal molybdenum wire furnace: for sintering tungsten - nickel alloy, tungsten heavy alloy (W-Ni-Fe, W-Ni-Cu, etc.), tungsten - copper and tungsten - silver alloy.

High temperature resistance furnace, induction furnace, etc.: for sintering pure tungsten and unit-based or multi-line solid-phase sintering of tungsten alloy.

Indirect sintering process: indirect sintering pure tungsten and unit production lines or multicomponent solid-phase sintering products.

The indirect heating furnace sintering sintering temperature below the sintering temperature pendant melting method. Therefore, the use of indirect sintering tungsten powder particle size and compaction pressure demanding.
Indirect sintering process developed in addition to choosing the right tungsten and its alloy powder, the blank size and weight are also important basis for requiring a slow warming and sufficient intermediate temperature holding time.

Indirect Production of Sintered Tungsten Heavy Alloy

Common high density tungsten-based alloy: W-Cu-Ni series and W-Ni-Fe series. Tungsten alloy commonly used in the production of this type of horizontal molybdenum wire furnace. To 90% W +2.5% Cu +7.5% Ni as an example. This is typical of the surface tension of the liquid and the solid - liquid interfacial tension, liquid phase sintering can be divided into three distinct phases boundary is.


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