The effects of annealing temperatures on the structure and optical property of tungsten oxide thin films by sputtering WO3 target have been investigated. It is found that the annealing treatments at 400℃ in the air caused as-deposited amorphous WO3 thin films to crystallize into the hexagonal WO3 phases accompanied by the triclinic phase. Increasing annealing time at 400℃ can improve the crystallinity of WO3 thin films and lead to a rougher surface morphology, where nanorod-like structure can be clearly observed. The resups from Raman spectra further confirmed the crystallinity of WO3 thin films with distinct vibration peaks of the W-O bonds and lattices after annealing at 400℃. When the annealing temperature increases from the room temperature to 400℃ the optical behaviors of the tungsten oxide thin film can be effectively influenced and the corresponding band gap varies from 2.82 eV to 3.27 eV.

 

 

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