Tungsten Silicide Application

On one hand, tungsten silicide is used in microelectronics as a contact material, with resistively 60-80μΩcm and it is often used as a shunt over polysilicom lines to increase their conductivity and increase signal speed. On the other hand, tungsten silicide also finds use in microelectromechanical systems and for oxidation-resistant coatings. Besides, tungsten silicide layer can replace tungsten films which are made by chemical vapor deposition. What’s more tungsten silicide is also used as a barrier layer between silicon and other metals such as tungsten.
Tungsten silicide layers can be prepared by chemical vapor deposition, besides films of tungsten silicade can be plasma-etched using for example nitrogen trifluoride. There is producing process as follow:
1.Using monosilane or dichlorosilane with tungsten hexafluoride as source gases.
2.The deposited film is non-stoichiometric and require annealing to convert to more conductive stoichiometric form.

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