Ammonium Paratungstate Used for Preparing Tungsten Trioxide Nano Film 2/2

Specific steps are as follows:
1. Preparing precursor solution
Dissolve APT in deionized water, then add a certain amount of dispersing agent and modifier, continually stir in the magnetic stirrer for 3-5 hours, and then stand constantly in the water bath environment at 70-90℃ to generate precursor solution;
2. Coating
Coat at substrate by dip-coating or spin-coating method, and dry under a suitable temperature condition. The substrate should be washed and other pre-dealing;
3. Roasting
Roasting the substrate at high-temperature (350-600) in a temperature controllable procedures muffle furnace for 2-5 hours after it is dried, and finally gets the nano tungsten trioxide film.

Its obvious advantages lay in:
1. Take APT as precursor, by adding dispersant and a modifier, final get nano tungsten trioxide film firmly adhesion to substrate;
2. The precursor solution can be stored for more than 3 months with a stable state and no precipitation phenomenon produced, it also can be reused, easy to operate, greatly reduced the production cost;
3. The dispersant and modifier added into precursor solution are entirely organic matter which can easily be oxidation and removed at high temperature, without introducing metal elements except W, especially metallic element of the alkali metal (Na+, K+), also it does not affect the performance of the photocatalytic activity of W0₃ and photoelectric conversion;
4. Nano tungsten trioxide film prepared is of excellent photoelectric properties.