Tungsten Hexafluoride’s Application

Tungsten hexafluoride (WF6) is only stable varieties in tungsten fluoride which can produce by industrial. It is mainly used in the chemical vapor deposition of tungsten, the chemical equation for this reaction is: WF6 + 3H2 → W + 6HF. The reduction of tungsten hexafluoride can be restore to metallic tungsten and HF by hydrogen or other reducing gas (such as GeH4, SiH2F2 and diethylsilane etc.) at high temperatures. Tungsten hexafluoride as a raw material widely used in the electronics industry as base of tungsten metal chemical vapor deposition (CVD) process technology, such as using WSi2 as wiring materials of LSI which is made by WF6. Besides, using CVD technology of mixing metal to produce tungsten and the rhenium complex coating may be used to manufacture X-rays emitter electrode of a solar absorber. What’s more WF6 in the electronics industry still mainly used as a semiconductor electrode and the conductive paste and other raw materials.
In addition to applications in the electronics industry, tungsten hexafluoride used in non-electronic aspect is also very broad. By CVD technology to generate hard tungsten carbide on the surface of the steel can improve the surface properties of the steel. Additionally, tungsten hexafluoride is also widely used in fluorinating agent, polymerization catalyst and feedstock of optical materials to manufacture low resistance and high melting point interconnect lines or some components, such as tungsten tube and crucibles.

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