Sputtering Gas Volume Influence Tungsten Oxide Nano Films

Using reactive sputtering method producing tungsten trioxide nano films found the average particle size diameter is less than 100nm. The grains size of the tungsten trioxide (WO₃) nano films are related to magnetic irradiation conditions and treatment temperature. After studied showed that sputtering gas volume and proportion play an important role at increase gas sensing property of nano WO₃ film.

By XPS analysis, although proportions of mixed sputtering gas (O₂ / Ar) is different, but the combination of W4f_{7 / 2} and Ols energy unchanged, namely 35.5eV and 530.6eV. And WO₃ film stoichiometric not change, but when the O₂ partial pressure is difference the WO₃ nano-film microstructure will be a great change, this phenomenon can be explained by reduction aggregate. That is when O₂ partial pressure increases the crystal grain size becomes smaller. However, if the O₂ partial pressure is greater than 50% then it will result porosity reduced, thereby reducing the sensitivity of original, indicating that the optimum sputtering mixing ratio is 1: 1. So the sputtering mixed gas (O₂ / Ar) ratio is 1: 1 which using DC reactive magnetron sputtering to produce WO₃ nano film has best gas sensing properties.

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