Tungsten Hexafluoride Scale Manufacturing

Tungsten hexafluoride (WF₆), colorless gas or light yellow liquid, solid is easy to deliquescent white crystals, smoke in humid air. Tungsten hexafluoride is a kind of tungsten fluoride which is used in the chemical evaporation of tungsten and as a fluoride agent. It can be reduced to tungsten and HF by hydrogen and other reducing gases at high temperature.

This reaction is widely used in the production of VLSI in electronic industry as raw material. Semiconductor devices, especially dynamic random access memory (DRAM) and high-performance microprocessors are the foundation of the process technology.

With the development of new technology, there are many kinds of special gas demand, the technical level of domestic enterprises is uneven, and the supply and demand of the market is in excess of demand in terms of quantity; but in terms of quality, only 36% of the production capacity can meet the technical requirements of special gases, so the supply of special gases meets the technical requirements of special gases. The shortage is basically dependent on imports. It can be seen that only by technological progress can special gas producers meet the quality requirements for the use of special gases. Recently, China's first large-scale tungsten hexafluoride production base invested by well-known enterprises Euro-China Electronics has opened in Chongqing, which makes up for the blank of large-scale manufacturing of electronic special gases in China.

It is understood that the patented tungsten hexafluoride production process adopted by the enterprise, its operational performance is safe and reliable, the system runs steadily, can achieve continuous production and chain automatic control. The process is as follows:

The 30 kg raw material 100 mesh tungsten powder was added into the reactor with cobalt trifluoride powder (size 89 4.5 1000), and the dehydration and drying operations were carried out with the equipment pipes (heating and vacuum, water content 3 ppm), then the reactor was heated to the reaction temperature conditions. During the reaction, the pressure of fluorine gas is increased to 2 bar by compressor, and then the fluorine gas is put into the reactor through the adsorber to react. The reaction temperature is 300 ℃, and the inlet flow is set at about 120L/min. The tail gas discharged from the reactor goes through the filter into the cryogenic collector to condense and collect WF₆, and the collection temperature is - 5 ℃. The function of the adsorber is to absorb the HF impurities contained in the tail gas; the WF6 in the tail gas of the cryogenic collector is gradually condensed to liquid at low temperature (below its boiling point temperature), and the uncooled gas in the tail gas is then pressurized by the compressor and returned to the reactor for reaction. The purified WF₆ was purified and purified to produce high purity WF₆.

Tungsten hexafluoride products are mainly used in semiconductor manufacturing process, which requires high purity. The raw materials used in the process, fluorine gas and tungsten powder are 5N fluorine gas and 3N tungsten powder, respectively. The effect and performance of the process have been relatively mature.

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