Tungsten Oxide Film Target Simple Sintering Method

Tungsten oxide thin film is a widely studied functional material. In optical glass, flat panel display, photoelectric conversion, electrochromic, photochromic and other fields have a wide range of application prospects.

Preparation methods of tungsten oxide thin films include physical vapor deposition, chemical vapor deposition, spray pyrolysis, anodization, electrolytic deposition, sol-gel and other methods. Physical vapor deposition is the most commonly used method. The quality of tungsten oxide thin film targets plays a decisive role in the effectiveness of physical vapor deposition methods. Sintered targets are also an important process.

Take blue tungsten oxide as intermediate oxide, average particle size is 15 microns, put 1-5% polyethylene glycol (PEG) as a molding agent. Distilled water is added and wet-milled in a ball mill for 24-96 hours. After drying and sifting, compression molding is performed at a pressure of 100-200 MPa. Sinter in the high temperature furnace at 1110°C-1400°C in air at normal pressure for 60-180 minutes, with the furnace cooling, the sintered blue tungsten oxide target material thus obtained, it has a purity higher than 99% and a density greater than 6.80g/cm3 ( Relative density ≥ 94%).

Tungsten oxide film target manufacturing method is characterized by no addition of any sintering aids, so that the purity of the sintered tungsten oxide is higher than 99%, and the density is more than 6.7g/cm³. This dense tungsten oxide material is suitable as a target for tungsten oxide plating.

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