Thin Film of Bismuth Tungstate

In recent years, some new materials with tungstate photocatalytic properties have been discovered, tungstate material belongs to semiconductor materials, because of its unique structure and physical and chemical properties, so it has a bright prospect of application in magnetic materials, catalyst and scintillation materials.

Bismuth tungstate (Bi₂WO₆) as a kind of material with narrow band gap photocatalytic material with visible light response of visible light and good catalytic activity, hydrothermal method using bismuth tungstate nano materials synthesis has a special layered structure, larger surface area, compared with other catalysts, with more obvious advantages of its application in the table on the surface of catalyst.

Nanometer photocatalysis materials are easy to agglomerate and difficult to recycle, the shortcomings of easy to poisoning in environmental applications, so take certain means fixed Bi₂WO₆photocatalyst, reduce loss, improve the recovery and reuse performance is very necessary, and the preparation of bismuth tungstate thin film is a very effective solution for manufacturing bismuth tungstate the thin films by magnetron sputtering technique. The method is as follows:

1)Preparation of bismuth tungstate powder: Na₂WO₄·2H₂O dissolved in distilled water by sodium tungstate solution, Bi (NO₃) ₃ - 5H₂O soluble in dilute nitric acid in the bismuth nitrate solution, sodium tungstate solution is slowly added into bismuth nitrate solution, the Na₂WO₄ - 2H₂O and Bi (NO₃)₃·5H₂O mole ratio is 1:2, fully mixing to uniform solution, adding sodium hydroxide solution and the pH value was adjusted to 5~7, obtained the precursor solution of the precursor solution to a hydrothermal reaction kettle for hydrothermal reaction, hydrothermal reaction after the end of reaction liquid centrifugal separation of solid components, the solid component of vacuum drying to obtain the bismuth tungstate powder.

2)Bismuth tungstate photocatalytic film preparation: the bismuth tungstate powder by dry pressing method are blank, the blank high temperature sintering for sputtering target, the target in the magnetron sputtering chamber, the quartz glass sheets with distilled water, acetone, ethanol and ultrasonic cleaning in magnetron sputtering chamber, controlling the magnetron sputtering chamber in vacuum is less than 2 * 10-3Pa, AR, adjusting the sputtering pressure, sputtering power and sputtering time, prepared bismuth tungstate photocatalytic film.

The bismuth tungstate photocatalyst film material is prepared by magnetron sputtering technology. The process is simple, easy to operate, highly reproducible, efficient and inexpensive. After making the target material made of bismuth tungstate photocatalyst, the magnetron sputtering process is applied to prepare the film. The prepared films have high purity, uniform thickness, good compactness, excellent visible light photocatalytic performance and wide application. They have strong practical value and application prospect in pollution control, radiation treatment, bacteria elimination and antivirus.

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