Tungsten Oxide Film Porous Structure

As a semiconductor oxide, tungsten oxide thin film materials have been widely used in many fields such as photocatalytic materials and color changing materials because of their excellent electrical and optical properties such as chemical or mechanical sensors, selective catalytic, environmental and industrial gas detection.

Tungsten oxide thin film porous structure is prepared through the use of spray plating(Electroplating technology: the use of electrolytic plating on some metal surfaces coated with a thin layer of other metals or alloys, the use of electrolysis is to metal or other materials attached to the surface of a film material process, so as to prevent the metal Oxidation, improve wear resistance, conductivity, reflectivity, corrosion resistance and enhance the appearance and so on) tungsten oxide film, and then nano-particles as a template plating tungsten oxide film, so that the tungsten oxide film has a special nano-structure, and finally by electrophoretic deposition method to change the tungsten oxide The structure of the thin film enables the tungsten oxide thin film to have a porous structure having high crystallinity.

The high crystallinity of the porous structure allows the tungsten oxide film has a larger specific surface area and more excellent discoloration. Since such methods mainly focus on the preparation of tungsten oxide films having a porous structure by using advanced preparation techniques, the preparation conditions of the porous oxide film structures are relatively harsh, thereby limiting the application range of the porous structure of the oxide films.

• < Prev
• Next >