In the past few years, an increasing interest has been put on the tungsten oxide films due to their potential applicanons in smart windows, gas sensors, photocatalytic reactions, and optoelectronic devices, etc. The unique properties of the tungsten oxide films were usually determined by the oxygen defects and the valence states of tungsten ions. Besides, it is very important to improve the properties of tungsten oxide films and other oxide films by controlling their morphologies and crystalline phases, which mainly depend on the preparation technologies and thermal treating temperatures and atmospheres.

 

 

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